Coagulation in Positive Photoresist and Resist Reclamation.

نویسندگان
چکیده

برای دانلود باید عضویت طلایی داشته باشید

برای دانلود متن کامل این مقاله و بیش از 32 میلیون مقاله دیگر ابتدا ثبت نام کنید

اگر عضو سایت هستید لطفا وارد حساب کاربری خود شوید

منابع مشابه

Absorption and exposure in positive photoresist.

A review of the theory of absorption on microscopic and macroscopic levels is given. This theory is then applied to the absorption of UV light by diazo-type positive photoresist during exposure. A formal treatment of the properties of polychromatic light is given. Using these analyses, the effects of polychromatic exposure of a photoresist are derived. Finally, experimental verification of Beer...

متن کامل

Precise structuring by 2-photon absorption in positive photoresist materials

Two-photon polymerization, based on two-photon absorption, is a convenient direct laser writing process to fabricate maskless structures in microand nanometer range with submicrometer resolution. Negative photoresists are used in combination with this technique, however, utilization of positive resists with two-photon absorption is very innovative. Due to less shrinkage and economic manufacturi...

متن کامل

assessing metacognitive awareness and learning strategies as positive predictors in promoting l2 learners’ reading comprehension

the purpose of this thesis was to investigate how differently metacognitive, cognitive, and social/affective strategies affect l2 learners’ reading comprehension. to this end, the study employed a quasi-experimental design with a placement test as a proficiency test to find the homogeneity of groups. three classes were randomly selected as the experimental groups (n =90), and each class was tau...

Laser interferometric nanolithography using a new positive chemical amplified resist

• A submitted manuscript is the author's version of the article upon submission and before peer-review. There can be important differences between the submitted version and the official published version of record. People interested in the research are advised to contact the author for the final version of the publication, or visit the DOI to the publisher's website. • The final author version ...

متن کامل

Pattern Photoresist Silicon Silicon Nitride Silicon Photoresist Silicon Nitride Silicon Etch Nitride Remove Photoresist

In this proposal we seek to establish a porous silicon based etching process in the WTC microfabrication laboratory. The new process will allow us to etch high aspect ratio holes through a wafer. Holes like these are important for decreasing the dead volume of connections between micro and macro systems and for increasing the complexity of micro-fluidic systems. At the present time, the minimum...

متن کامل

ذخیره در منابع من


  با ذخیره ی این منبع در منابع من، دسترسی به آن را برای استفاده های بعدی آسان تر کنید

ژورنال

عنوان ژورنال: Journal of Photopolymer Science and Technology

سال: 1998

ISSN: 0914-9244,1349-6336

DOI: 10.2494/photopolymer.11.153